ASBAN bin Dolah. (1995). Wafer processing and prosess development of 1 Nm CMOS: Oxidation (Pemindahan Teknologi dari Frunhofer Institute,Dresden,Germany)8.3.1995-3.6.1995. Fraunhofer Institute.
Chicago Style (17th ed.) CitationASBAN bin Dolah. Wafer Processing and Prosess Development of 1 Nm CMOS: Oxidation (Pemindahan Teknologi Dari Frunhofer Institute,Dresden,Germany)8.3.1995-3.6.1995. Dresden: Fraunhofer Institute, 1995.
MLA (9th ed.) CitationASBAN bin Dolah. Wafer Processing and Prosess Development of 1 Nm CMOS: Oxidation (Pemindahan Teknologi Dari Frunhofer Institute,Dresden,Germany)8.3.1995-3.6.1995. Fraunhofer Institute, 1995.
Warning: These citations may not always be 100% accurate.