ROSMINAZUIN binti Ab Rahim. (2004). Significance of post oxidation annelaing (POA) and post metallization annealing (PMA) on the capacitance-voltage characterization of Si3N4 MOS capacitor. Universiti Kebangsaan Malaysia.
Chicago Style (17th ed.) CitationROSMINAZUIN binti Ab Rahim. Significance of Post Oxidation Annelaing (POA) and Post Metallization Annealing (PMA) on the Capacitance-voltage Characterization of Si3N4 MOS Capacitor. Bangi: Universiti Kebangsaan Malaysia, 2004.
MLA (9th ed.) CitationROSMINAZUIN binti Ab Rahim. Significance of Post Oxidation Annelaing (POA) and Post Metallization Annealing (PMA) on the Capacitance-voltage Characterization of Si3N4 MOS Capacitor. Universiti Kebangsaan Malaysia, 2004.
Warning: These citations may not always be 100% accurate.