Significance of post oxidation annelaing (POA) and post metallization annealing (PMA) on the capacitance-voltage characterization of Si3N4 MOS capacitor

Bibliographic Details
Main Author: ROSMINAZUIN binti Ab Rahim
Format: Book
Published: Bangi : Universiti Kebangsaan Malaysia , 2004

MARC

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100 1 0 |a ROSMINAZUIN binti Ab Rahim 
245 1 0 |a Significance of post oxidation annelaing (POA) and post metallization annealing (PMA) on the capacitance-voltage characterization of Si3N4 MOS capacitor   |c Rosminazuin binti Ab Rahim 
260 0 0 |a Bangi :   |b Universiti Kebangsaan Malaysia ,   |c 2004 
300 |a xiv,53p. ;   |c 30cm. 
500 0 0 |a Thesis(M.Sc in Microelectronics)-UKM,2004 
999 |a D000005260   |b THESIS AND DISSERTATIONS   |c REFERENCE   |e Default branch